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Categories: T&M, Miscellaneous Test Equipment
Manufacturer: Oxford instruments
Condition: Used
Seller: Bid Service, LLC
Oxford Instruments OPAL ALD Atomic Layer Deposition System. The Oxford OpAL is a...
Oxford Instruments OPAL ALD Atomic Layer Deposition System. The Oxford OpAL is a plasma or thermal assisted atomic layer deposition system ALD. It is an open loop (non-loadlocked) tool which had two channels for metal organic precursors, one channe1 for water and a plasma head. System Overview Hardware Details Single open-loop vacuum chamber with heated table and heated sidewalls 8.25" Heated table can run 80-300ordm;C Downstream 300 W RF plasma head with isolation valve Software to run loops of dose/purge cycles to enable ALD Substrate Requirements 8.25" Diameter circular, flat table. Substrates must be able to handle 100-250C heating depending on process. Due to aggressive pumping/purging very small samples or powders not recommended. 208V, 3Ph, 60Hz, 25AInvNumber: 65004
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Oxford instruments OPAL ALD
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